Unveiling the veil of workplace Loneliness: A Theory-Concept-Methodology (TCM) framework

Authors

  • Archana Choudhary Birla Global University
  • Biswa Prakash Jena Birla School of Management, Birla Global University, Bhubaneswar, Odisha, India
  • Smruti Patre Symbiosis Institute of Business Management, Nagpur Constituent of Symbiosis International (Deemed) University, Pune

DOI:

https://doi.org/10.13133/2724-2943/17820

Keywords:

Loneliness, Workplace Loneliness, Theory-Concept-Methodology

Abstract

The aim of the study is to learn more about the causes and effects of workplace loneliness. The study uses a TCM (Theory, Context, Methodology) framework based on various studies to critically assess and analyse the existing body of research on workplace loneliness from 2010 to 2021. This paper tries to do a comprehensive review of the antecedents, underlying processes, and outcomes, which will provide future directions for further development of the workplace loneliness construct and identify significant opportunities for researchers to advance the field's theoretical and empirical development.

Additional Files

Published

2024-04-12

How to Cite

Choudhary, A., Jena, B. P., & Patre, S. (2024). Unveiling the veil of workplace Loneliness: A Theory-Concept-Methodology (TCM) framework. Psychology Hub, 41(1). https://doi.org/10.13133/2724-2943/17820

Issue

Vol. 41 No. 1 (2024)

Section

Original Article

License

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